NILCom Consortium to highlight latest developments at nano tech 2010
NANO TECH 2010-TOKYO, JAPAN, February 9, 2010 - NILCom, a nanoimprint lithography consortium comprising companies and research organizations throughout the imprint lithography supply chain, will be exhibiting at nano tech 2010 held February 17-19 in Tokyo, Japan.
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New Collaboration in the Nanoimprint Lithography Industry
The leading provider of stamps for nanoimprint lithography, NIL Technology, and IMS Chips, announced at the NILCOM meeting, January 8th, in Schaerding, Austria that they have started a collaboration on the fabrication of stamps for nanoimprint lithography (NIL) by combining their electron beam lithography (EBL) expertises.
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EV Group launches global consortium to speed commercialization of nanoimprint lithography
SCHÄRDING, Austria – Dec. 7, 2004 - EV Group (EVG), which has the world's largest installed base of nanoimprinting equipment, today announced the launch of a global consortium dedicated to commercializing advanced nanoimprint lithography (NIL) technologies.
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EV Group expands UV-nanoimprint consortium, sponsors Canadian nanotechnology conference
SCHÄRDING, Austria – Aug. 25, 2004 - EV Group (EVG), a leading manufacturer of MEMS, nano and semiconductor wafer-processing equipment, today announced that a major Canadian research organization has joined its nanoimprint lithography consortium.
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