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AMO
GmbH has installed the worldwide first step-and-repeat nanoimprint
lithography system for industrial fabrication of nanoscale devices from
EV Group
EV
Group expands UV-nanoimprint consortium, sponsors Canadian
nanotechnology conference
EV
Group launches global consortium to speed commercialization of
nanoimprint lithography
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NEWS
RELEASE
AMO
GmbH has installed the worldwide first step-and-repeat nanoimprint
lithography system for industrial fabrication of nanoscale devices from
EV Group
2006-04-24
AACHEN, Germany - April 24, 2006 - AMO GmbH (AMO), a
german research foundry in nanoelectronics, photonics and biotechnology
added a new highlight to its nanostructuring equipment.
Within a joint development program of EV Group and AMO
an automated step-and-repeat UV-based Nanoimprint Lithogaphy (UV-NIL)
system, the EVG770 NIL Stepper, has been developed, manufactured and
installed at AMO.
UV-NIL
is a next-generation lithography technology technique and a potential
contender to succeed optical lithography for the 32-nm node, according
to the International Technology Roadmap of Semiconductor (ITRS). AMO is
working on UV-NIL for performing R&D and small scale production for
applications in the area of photonic devices, nanoelectronics, and life
sciences. Nanoimprint lithography is an innovative patterning technology
that provides a lower cost-of-ownership model compared to current
manufacturing lithography tools. EV Group has the largest installation
base worldwide for single-step imprinting equipment and this new NIL
stepper enhances the company’s product portfolio substantially.
The
special feature of EV Group´s new NIL stepper includes imprint under
reduced environmental pressure, which enables low input pressures, fast
process times and enhanced pattern fidelity compared to other technical
solutions in ambient pressure. The step-and-repeat NIL system offers a
lithography resolution down to 10 nm and targets sub-50-nm overlay
alignment accuracy via a novel dual-stage alignment approach.
EVG,
which has been participating in joint-development programs with AMO, is
speeding the commercialization of NIL. EV Group is the founding member
of NILCom which is a technology platform supported by an established
infrastructure, qualified processes and including leading technology
companies.
About
AMO GmbH / AMICA
The private non-profit company AMO GmbH (Gesellschaft für angewandte
Mikro- und Optoelektronik) is committed to applied research in the area
of micro-, nano- and optoelectronics since 1997. The department AMICA
(Advanced Microelectronic Center Aachen) is dedicated to nano
lithography technology with major emphasis on UV-NIL activities. Mature
Electron-Beam Lithography, down to sub 10 nm features, and CMOS process
technology has been the basis for application studies of UV-NIL
research, which is being improved in terms of resolution, overlay
precision and reliability. For more information on AMO’s research
activities and services please visit www.amo.de.
Editorial contact:
AMO GmbH
AMICA
Huyskensweg 25
D-52074 Aachen
Germany
Telephone : +49 (0)241 8867 0
Fax : +49 (0)241 88 67 560
Email : amo@amo.de
Web: www.amo.de
About
EV Group
Founded in 1980, EV Group is a global supplier of wafer bonders,
aligners, photoresist coaters, cleaners and inspection systems for
semiconductor, MEMS and emerging nanotechnology markets. EV Group holds
the dominant share of the market for wafer bonding equipment (especially
SOI bonding) and is a leader in lithography for advanced packaging and
nanotechnology. The company´s unique Triple I approach (Invent -
Innovate - Implement) is supported by a vertical infrastructure,
allowing EV Group to respond quickly to new technology development,
apply the technology to manufacturing challenges and expedite volume
production. Headquartered in St. Florian, Austria, EV Group operates via
a global customer support network, with subsidiaries in Tempe, Arizona;
Albany, New York; Yokohama and Fukuoka, Japan; and Chung-Li, Taiwan. For
more information, visit www.EVGroup.com.
Company
Contact:
Markus Wimplinger
EV Group Inc.
+1 480 727 9604
M.Wimplinger@EVGroup.com
_________________________________________________________________________________________________________________________________________________
NEWS
RELEASE
EV
Group expands UV-nanoimprint consortium, sponsors Canadian
nanotechnology conference
SCHÄRDING,
Austria – Aug. 25, 2004 - EV Group (EVG), a leading manufacturer of
MEMS, nano and semiconductor wafer-processing equipment, today announced
that a major Canadian research organization has joined its nanoimprint
lithography consortium. In
addition, the company announced plans to sponsor and participate in COMS
2004, an Aug. 29-Sept. 2 conference in Edmonton, Alberta, that will
focus on the commercialization of nano and MEMS devices.
EV
Group, which has the world's largest installed base of nanoimprinting
equipment, said the National Research Council of Canada’s Industrial
Materials Institute (NRC-IMI) joined the consortium that EVG formed last
year. The consortium is working to commercialize advanced nanoimprint
lithography (NIL) technologies, a next-generation lithography method
that utilizes a low-cost, high-resolution and large-area patterning
process.
Both
the consortium and the COMS 2004 sponsorship come on the heels of the
company’s successful expansion into Canada.
Last
fall, the NRC-IMI purchased an EVG520HE semi-automated hot-embossing
system to pattern surfaces for various applications, from
bio-recognition to magnetic data storage. In addition, DALSA Corp., the
Ontario-based maker of processed silicon wafers and packaged silicon
chips, purchased EVG’s GEMINI wafer bonder cluster tool and a HERCULES
thick-polymer lithography tool for high-volume MEMS manufacturing.
“As
the leading global supplier of nano-imprint lithography equipment, EV
Group is committed to helping our Canadian partners develop and
commercialize emerging micro and nanotechnologies,” said Dr. Peter
Podesser, chief executive officer of EVG. “The NIL consortium is
focused on providing total, high-volume nanoimprint lithography
solutions, equipment and processes for chemicals, templates and major
semiconductor companies."
EV
Group is the leading industry sponsor of COMS 2004, and several of its
executives and scientists will participate in conference sessions. Dr.
Podesser and Dr.
Christian Schaefer, senior
vice-president of sales, will chair events at the conference. EV
Group also will make technical presentations on low-temperature wafer
bonding for MEMS packaging, on hot-embossing technology for the
fabrication of novel-type microfluidic devices, and on spray coating for
industrial high-yield photo-lithography.
NRC-IMI
is a leading Canadian research center that conducts multidisciplinary
research on breakthrough technologies related to materials development
and processing, and is considered a key player in Canada’s
nanotechnology research and development.
About
EV Group
Founded in 1980, EV Group is a global supplier of wafer bonders,
aligners, photoresist coaters, cleaners and inspection systems for
semiconductor, MEMS and emerging nanotechnology markets. EV Group holds
the dominant share of the market for wafer bonding equipment (especially
SOI bonding) and is a leader in lithography for advanced packaging and
nanotechnology. The company’s unique Triple I approach (Invent -
Innovate - Implement) is supported by a vertical infrastructure,
allowing EV Group to respond quickly to new technology development,
apply the technology to manufacturing challenges and expedite volume
production. Headquartered in Schärding, Austria, EV Group operates via
a global customer support network, with subsidiaries in Phoenix,
Arizona; Cranston, Rhode Island; Yokohama, Japan; and Chung-Li,
Taiwan.
Company
Contact:
Markus Wimplinger
EV Group Inc.
+1 480 727 9604
M.Wimplinger@EVGroup.com
_____________________________________________________________________________________________________________________________________________________
NEWS
RELEASE
EV
Group launches global consortium to speed commercialization of
nanoimprint lithography
SCHÄRDING, Austria –
Dec. 7, 2004 - EV Group (EVG), which has the world's largest installed
base of nanoimprinting equipment, today announced the launch of a global
consortium dedicated to commercializing advanced nanoimprint lithography
(NIL) technologies. NIL is a next-generation lithography method that
utilizes a low-cost, high-resolution and large-area patterning process.
Known as NILCom, the
consortium is a technology platform supported by an established
infrastructure and qualified processes, including leading technology
companies and research centers. Its mission is to establish a high
volume manufacturing NIL platform in nano-electronics, data storage,
life sciences and opto-electronics by creating a technology interface
for qualifying and standardizing the related infrastructure.
“A
recent report by Lux Research projected NIL to be the long-term winner
among nanolithography platforms, and noted that toolmakers need to work
together for our mutual interests,” said Dr. Peter Podesser, chief
executive officer of EV Group. “NILCom does that and more. We have
assembled critical elements of the entire supply chain. Spanning North
America, Europe and Asia, we will leverage NIL synergies and support
accelerated market segmentation for key applications. With our leading
companies and research centers of excellence, we will focus on providing
total, high-volume NIL solutions, equipment and processes for chemicals,
templates and leading IC manufacturers."
NILCom
will facilitate transparency and availability of NIL requirements and
infrastructure, including template standardization, materials
qualification and advanced metrology solutions. Devices and applications
developed with NILCom technology can take full advantage of the most
advanced and cost efficient pattern-replication methods, promoting an
accelerated product commercialization path.
NILCom
members include:
Templates:
IMS-Chips / Institut für Mikroelektronik Stuttgart, Quantiscript Inc.,Transfer
Devices Inc.
Resist:
Micro Resist Technology GmbH, Toyo Gosei Co., Ltd (New Business
Development, Photosensitive Materials Research Center)
Processes:
AMO GmbH, National Research Council of Canada’s Industrial Materials
Institute (NRC-IMI), Waseda University
Equipment:
EV Group, Applied MicroStructures
Inc.
Metrology:
Leica Microsystems AG
“Our investments in
imprint lithography are already proving very beneficial as the
technology is becoming ever more useful for low cost, high-throughput
micro- and nanopatterning using polymers. Participating in the NILCom
consortium allows us to accelerate the development of solutions in
fabrication technologies for Canadian industry. Further investments are being planned as NRC-IMI has chosen
to expand the nanoimprint R&D facilities and build a NIL Prototyping
Centre dedicated to providing services to our client base,” says
Michel Dumoulin, Director of Advanced Materials Design at IMI. “Hot
embossing, UV-NIL and micro-contact printing capabilities will be
available at the centre, slated to open in 2005, allowing our clients to
use their ideas into products in areas from bio-sensing to magnetic data
storage.”
Olaf
Fortagne, corporate manager technology partnership at Leica Microsystems
AG said, “Leica considers NIL to be a fast-growing business in areas
of semiconductor and nano technologies. As a member of NILCom, Leica
sees a strong demand for tools to process adaptation and standardization
based on proven tool platforms.”
“We
welcome the opportunity to work with our partners in the NILCom
consortium to deliver comprehensive solutions for nanoimprint
lithography,” said Andrew G. Zanzal, Quantiscript’s vice president,
business development. “Since sub-50nm imprint templates are a key
enabler to this technology, we see great benefit to being closely
aligned with other organizations working to advance the technology in
this regime.”
The
official launch ceremony took place at NNT ’04 - the 3rd
international conference on nanoimprint and nanoprint technology – in
Vienna, Austria on December 2.
Visit
www.NILCom.org for more information on
the consortium.
About
NRC-IMI
NRC-IMI
is a leading institute of National Research Council of Canada and
conducts multidisciplinary research on breakthrough technologies related
to materials development and processing, and is considered a key player
with a growing position in the Canadian nanotechnology area.
It helps Canadian companies meet the risks of the new economy by
providing them competitive advantages and the required leverage to grasp
opportunities.
Contact:
Dr.
Michel Dumoulin
Director,
Advanced Materials Design
+1
(450) 641-5181
Fax:
+1 (450) 641-5105
michel.dumoulin@cnrc-nrc.gc.ca
www.imi.cnrc-nrc.gc.ca
About
Leica Microsystems AG
Leica
Microsystems is a leading global innovator, manufacturer and supplier of
high precision optical solutions based on microscopes and related
instruments. Leica Microsystems manufactures a comprehensive portfolio
of products used in a wide variety of applications in the life sciences,
the material sciences, industrial inspection and the semiconductor
manufacturing industry.
About
Quantiscript
Quantiscript
Inc is a commercialization stage start-up company located in Sherbrooke,
Quebec, Canada. Quantiscript's core business is development and
licensing of resists and associated processes used to enable e-beam
writing of high resolution pattern transfer artifacts such as mask and
nano-imprint stamps. The company's initial product, QSR-5™, has been
proven useful in the fabrication of nano-imprint stamps in the sub-100nm
regime. With QSR-5™ and Quantiscript's suite of fabrication tools,
early adopters of NIL can take advantage of the infrastructure and
processes to obtain custom made nano-imprint templates for research
purposes.
About EV Group
Founded in 1980, EV Group
is a global supplier of wafer bonders, aligners, photoresist coaters,
cleaners and inspection systems for semiconductor, MEMS and emerging
nanotechnology markets. EV Group holds the dominant share of the market
for wafer bonding equipment (especially SOI bonding) and is a leader in
lithography for advanced packaging and nanotechnology. The company’s
unique Triple I approach (Invent – Innovate – Implement) is
supported by a vertical infrastructure, allowing EV Group to respond
quickly to new technology development, apply the technology to
manufacturing challenges and expedite volume production. Headquartered
in Schärding, Austria, EV Group operates via a global customer support
network, with subsidiaries in Tempe, Arizona; Albany, New York; Yokohama
and Fukuoka, Japan; and Chung-Li, Taiwan. For more information, visit http://www.evgroup.com.
Company Contact:
Markus Wimplinger
EV Group Inc.
+1 480 727 9604
M.Wimplinger@EVGroup.com
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