_______________________________________________________________________________________________
Nanoelectronics:
Technology to Markets - SEMICON Europa 2006
April
04 2006
München
Information
_______________________________________________________________________________________________
SPIE
Microlithography 2006
Feb.
19-24.2006
San
Jose, California USA
more
information:
http://spie.org/Conferences/Calls/06/ml/
____________________________________________________________________________________________
EMLC-Konferenz (European Mask and Lithography Conference)
Jan. 23-26,2006
Dresden
Information
_______________________________________________________________________________________________
4. Internationales Nanotechnologie Symposium - Neue Ideen für die
Industrie
Nov.
29-30,2005
Dresden
http://www.vdi.de/nanofair
Programm
_______________________________________________________________________________________________
VDMA-SEMI Productronica Forum
Nov.
15-15.2005
München,
Hall B5 (Booth# B5.265)
Information
_________________________________________________________________________________________________
DGM - Sitzung des Fachausschusses Dünne Schichten
Okt.
20-21, 2005
Wien,
Tech Gate Vienna, Anreise: http://www.techgate.at/anreise/
Programm
_________________________________________________________________________________________________
NSTI
NanoSPRINT: 1st Workshop on Nano Technology Transfer
Dec.
15, 2005
Hotel
Mercure Paris Tour Eiffel Suffren,
http://tima.imag.fr/conferences/ENS/index.html
_________________________________________________________________________________________________
The
4th International Conference on Nanotechnology and Nanoprint
Technology (NNT’0599), Japan
Oct.
19-21, 2005
Nara
City, Japan
http://wecretaryart.co.jp/nnt/
_________________________________________________________________________________________________
Taiwan Nano Tech2005
September
23-25, 2005
Location:
Taipei World Trade Center, Exhibition Hall, Area A, Taipei, Taiwan
http://www.taipeitradeshows.com.tw/nano/general.htm
_________________________________________________________________________________________________
MNE
2005 - 31st
International Conference on Micro- and Nano-Engineering
19
- 22 September 2005
Location:
Vienna, Austria
MNE Poster Session: 3-f Nanoimprint Lithography & Technology
Presentation
Date: Tuesday, 20 September 2005, 4pm - 7pm
Abstract
Title: NILCom - Commercialization of Nanoimprint Lithography
www.mne05.org
_______________________________________________________________________________________________
10th
International Conference on the Commercialization of Micro and Nano
Systems (COMS2005)
August
21 -25, 2005
Organizer:
Forschungszentrum Karlsruhe, and MANCEF
Location:
Baden-Baden, Germany
http://www.mancef-coms2005.org
_________________________________________________________________________________________________
NILCom(R)
seminar in Canada
July 7-8, 2005
At the
Industrial Materials Institute -
NRC
75,
de Mortagne, Boucherville, Quebec
more information
http://www.reseaumateriauxquebec.ca/nanofab2005/
_________________________________________________________________________________________________
Seminar: 104th Technical
Symposium, Japan
May
31, 2005
09:25-18:25
Organizer: Electronic Journal, Inc.
Location: Kokuyo hall at
shinagawa in Tokyo, Japan
Our lecture time: 40min.
_____________________________________________________________________________________________
2005
NSTI Nanotechnology Conference and Trade Show, USA
Booth
# 707
May
8-12, 2005
Anaheim,
USA
Presentation
during Session Micro- and Nanofluidics Towards a Design Methodology: “NILCom
- Commercialization
of Nanoimprint Lithography”
Authors:
H. Luesebrink T. Glinsner, Ch. Moormann, A. Fuchs
http://www.nanotech2005.com
_________________________________________________________________________________________________
n-able
2005, Saarbrücken
Nanotechnology
in Manufacturing
May
9-11, 2005
Location:
Saarbrücken
_________________________________________________________________________________________________
IEEE
International Workshop on Design and Test of Defect-Tolerant Nanoscale
Architectures
(NANOARCH'05), USA
May
1, 2005
To
be held in conjunction with the VLSI Test Symposium
The
Lodge at Rancho Mirage, Palm Springs, CA, USA
_________________________________________________________________________________________________
Seminar: Development trend and applied technology of nanoimprint
lithography, Japan
April
21, 2005
10:30-16:30
Organizer:
Joho kaihatsu kenkyujo Inc.
Location: Ohi town kyurian in Tokyo, Japan
Our lecture time: 150min.
_________________________________________________________________________________________________
Seminar:
Micropatterning Technical Committee, Munich
April 12, 2005 11:00-13:00
Organizer:SEMI
International Standards Program
Location:
International Congress Center, Munich, Germany
http://wps2a.semi.org/wps/portal/_pagr/128/_pa.128/461?&dFormat=application/msword&docName=P034790
_________________________________________________________________________________________________
SEMICON
Europa, MEMS/NEMS Platform, Munich
Hall
B2, Booth No. 642.9
April
12-14, 2005
Munich,
Germany
Booth
and presentation
http://www.semi.org/semiconeuropa
_________________________________________________________________________________________________
Seminar: 69th VLSI FORUM, Japan
March
18, 2005 13:00-17:20
Organizer:
Press Journal Inc.
Location: Gakushi-kaikan in
Tokyo, Japan
Seminar title: 69th VLSI FORUM
Our lecture time: 35min
_________________________________________________________________________________________________
NILCom
Seminar Korea
March
9, 2005
Arranged
by JinSan and EV Group
At
SKK University Suwon
_________________________________________________________________________________________________
NILCom
Seminar in conjunction with Nanotech Japan
Feb.
22, 2005
Rihga
Royal Hotel Tokyo, Tokyo, Japan
Arranged
by NILCom members Toyo Gosei, Waseda University and EV Group Japan KK
